SVS-V2000 Batch Sputter System

 

  



main function :  

Specialising in thin film depodition systems
for Semiconductor and the sample preparation in lab.

main feature :

• Range of chamber sizes from 600mm to 1200mm ;

• Multiple single or multi hearth e-beam guns;

• Substrate fixturing systems to include planetary,rotary or linear motion;

• Deposition rate monitors & control systems ;

• Reactive gas admission for oxide/nitride production ;

• Full system automation .

 

 

 

 


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